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Overview
Silica glass ampoule is a high-purity containment vessel manufactured from fused quartz via flame fusion or electric melting processes. It features exceptional thermal shock resistance and chemical inertness, serving as a critical barrier for semiconductor crystal growth and specialized material synthesis under extreme conditions.
Application
- Semiconductor Industry: Used in Czochralski (CZ) and Float Zone (FZ) furnaces for silicon ingot production.
- Optical Manufacturing: Enclosures for UV lamp manufacturing and fiber optic preform sintering.
- Laboratory Analysis: Crucibles for high-temperature spectroscopy and vacuum distillation systems.
Precautions
- Temperature: Continuous operation limited to 1100°C; softening point at 1600°C.
- Environment: Avoid rapid thermal cycling below -40°C to prevent micro-cracking.
- Maintenance: Handle only with non-abrasive tools; clean exclusively with HF-free solvents to preserve surface integrity.